Nanoimprint. In this short video, we show the most basic operations in the C...

Starting from the first demonstration of thermal nanoim

The different wafer diameters of (a) and (b) were chosen for compatibility with the two different etching equipment used to perform Bosch DRIE and Cryogenic DRIE, respectively. Afterwards, the nanoimprint process was carried out with an EVG620 mask aligner working at a constant time exposure mode. The exposure was performed with 31 mW/cm 2 for ...Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad ... Jun 15, 2023 · Nanoimprint lithography (NIL) has attracted attention recently as a promising fabrication method for dielectric metalenses owing to its low cost and high throughput, however, high aspect ratio (HAR) nanostructures are required to manipulate the full 2π phase of light. Conventional NIL using a hard-polydimethylsiloxane (h-PDMS) mold inevitably incurs shear stress on the nanostructures which is ... Nanoimprint lithography (NIL), which is being jointly developed. Semiconductor manufacturing at NIL: It was clarified that “power consumption can be reduced to 1/10 compared to EUV exposure”. NIL has many problems before mass production, but at present, it has succeeded in forming the most advanced circuit line width.Unlike the traditional mechanical machining method, the nanoimprint method is a highly efficient way to fabricate nanopatterned structures on the surface of a Nafion membrane, including the structural fabrication of a template and hot-pressing process, as shown in Fig. 3 (a) and (b) [74, 75]. The key step of this method is to replicate the ...Nanoimprint lithography is a high resolution and low-cost approach to fabricate nanostructures over a large area. This paper reviews recent progress of nanoimprint lithography and its applications in flexible electronics. The basic principles, classification, research focus, and critical issues of nanoimprint lithography are elaborated. ...Non-planar morphology is a common feature of devices applied in various physical fields, such as light or fluid, which pose a great challenge for surface nano-patterning to improve their performance. The present study proposes a discretely-supported nanoimprint lithography (NIL) technique to fabricate nanostructures on the extremely non-planar surface, …Nanoimprint Lithography is a nano-manufacturing process that enables the replication of micro- and nanostructures with the capability of low-cost, high throughput and large scale patterning [7]. Nanoimprint lithography can be used for a wafer-scale definition of Au dot arrays for selective epitaxial growth of III-V nanowires and also in ...Fast and accurate alignment with SUSS Singlefield or Splitfield Microscope. High Resolution Optics optmized for thick resists. The Universal Optics Option for fast switching between different wavelengths. Upgradable with a retrofit kit for UV-Nanoimprint Lithography. The MJB4 is widely used for MEMS and optoelectronics applications, such as LED ...Nanoimprint lithography (NIL) (Refs. 1 and 2) has emerged as a promising technique for patterning and transferring nanoscale patterns without having to use complicated and expensive optical apparatus. Based on the mechanical deformation principle, this technique is obviously distinct from traditional optical lithography techniques, and beyond ...5 Okt 2021 ... Roll-to-roll nanoimprint lithography (R2R-NIL) is an enabling technology for the low-cost mass production of high-quality micro- and nano-sized ...Structural anti-reflective coating and bactericidal surfaces, as well as many other effects, rely on high-aspect-ratio (HAR) micro- and nanostructures, and thus, are of great interest for a wide range of applications. To date, there is no widespread fabrication of dense or isolated HAR nanopillars based on UV nanoimprint lithography (UV-NIL). In …Nano patterning and Nanoimprint lithography [NIL] has advanced to great heights in recent years. Customizing the surface at micro and nano scale is of great demand. It facilitates the handling and working at micro and nano scale level. Its applications towards medical field are growing day by day.nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale app lic atio n. In the presen t work, a gene ra l litera tur e review on the ...Imprint lithography is an effective and well-known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows ...Nanonex NX-2500 Nanoimprinter. Nanonex Nanoimprinter. The Nanonex nanoimprint lithography system is used to create nano-scaled features in polymer ...Imprint lithography is essentially a micromolding process in which the topography of a template defines the patterns created on a substrate. When the printing is done at the nanoscale the various imprint methods are generally referred to as nanoimprint lithography (NIL). There are three basic approaches to imprint lithography: soft lithography ...NIL Ecosystem Session. NNT2023 will offer a unique nanoimprint ecosystem session with full length technical talks and a closing roundtable discussion in which providers of tools, masters, materials and open access research and process development facilities will converge in a single session to deliver a comprehensive look at potential commercialization …nanoimprint process shown in Fig. 2b, c was developed capable of producing bits down to 30 nm for the study of complex memristor plus selector material stacks. The fabrication of transistors by nanoimprint lithog-raphy was another one of the early indications of the promise of the technique for applications in the semi-conductor industry.Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like substrates. It is essentially a 3D process, because it replicates various stamp ...Nanoimprint lithography (NIL) is one of the most popular manufacturing technologies for the mass production of microstructure [1]. For this technique, the microstructures on polymeric materials are mechanically formed by imprinting the predesigned structures at an elevated temperature. In industrial applications, the local mechanical properties ...In nanoimprint experiments a concave Si mold was used where features of its patterns were defined by depth = 3 μm, length = 1.8 μm, and linewidths = 500, 750 nm, and 1 μm. The Si mold was fabricated by micro-electro-mechanical-system (MEMS) processing technologies including an e-beam lithography and a reactive-ion-etching (RIE).Roller-type nanoimprint lithography is a technique that can potentially increase the throughput of the imprinting process to levels competitive for low-cost, large-area, nanoscale manufacturing. A paper in this issue by Ahn and Guo presents a large-area roll-to-roll and roll-to-plate imprint process that builds on earlier work, increasing the substrate width to 4 in. and …Nanoimprint lithography (NIL) has gained increasing popularity as a cost efficient technology to replicate nanostructures in the sub-25-nm regime 1,2 with high throughput.With all dominant NIL concepts—UV-nanoimprint lithography, hot embossing, and microcontact printing-the NIL template is the most critical component as it defines the minimum feature size.Nanoimprint lithography (NIL) is an indispensable tool to realize a fast and accurate nanoscale patterning in nanophotonics due to high resolution and high yield. …Resist is one of the key components for nanoimprint lithography (NIL) in addition to the imprint mold, the imprint machine, and imprint processes[1, 2].Depending on the process, nanoimprint resists can be classified into two basic categories: thermoplastic polymers[] or thermal curable materials[4, 5] for thermal-NIL, and UV-curable monomers or oligomers for UV …The soft UV nanoimprint is a versatile and inexpensive fabrication method for mass production of nanostructures , . As shown in the SEM image of Figure 2 , the gold nanocaves are uniform with the periodic spacing of ~500 nm and the diameter of ~250 nm, and the depth of ~200 nm for the nanocaves is also confirmed by an AFM system (Figure S1).Nanoimprint is a promising large-area fabrication technology for the industrial-scale mass production of meta-devices [60–62]. Through mechanical pressure and UV curing, nano/micro-structure patterns can be transferred from a mold to the target soft material using a stamping method [ 63 – 65 ].The Global Nanoimprint Lithography System Consumption Market is growing at a faster pace with substantial growth rates over the last few years and is estimated that the market will grow significantly in the forecasted period i.e. 2023 to 2031. The Global Nanoimprint Lithography System Consumption Market report provides a holistic evaluation of ...The HERCULES NIL, a fully integrated UV nanoimprint lithography track solution for wafers up to 200 mm, is the latest addition to EVG's NIL product portfolio. Based on a modular platform, the HERCULES NIL combines EVG's proprietary SmartNIL imprinting technology with cleaning, resist coating and baking pre-processing steps.NX-2000, Full-Wafer Universal Imprintor. Full-wafer (up to 12") nanoimprinting tool. Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity. All forms of nanoimprint: photo-curable, thermoplastic & embossing. High throughput due to full-wafer impriting: sub-60 sec/wafer. Optional alignment upgrade available.Nanoimprint lithography (NIL) is a high throughput, high-resolution parallel patterning method in which a surface pattern of a stamp is replicated into a material by mechanical contact and three ...The nanoimprint replication of biomimetic nanostructures can be interesting for a wide range of applications. We demonstrate the process chain for Morpho-blue-inspired nanostructures, which are especially challenging for the nanoimprint process, since they consist of multilayer undercut structures, which typically cannot be replicated using nanoimprint …The authors succeeded in glass-nanoimprint lithography of micropatterns and nanopatterns using an amorphous Ni-P alloy mold. Glasslike carbon has been used as a mold material to mold not only Pyrex glass but also quartz, because it is still stable at a temperature of 1650 ° C ⁠.However, it is difficult to process glasslike carbon substrates into arbitrary shapes by machining.Editor. José María De Teresa Published. December 2020. Download ebook. PDF. ePub. Kindle. A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications.Soft UV-nanoimprint lithography (UV-NIL) by using a flexible mold has been proven to be a cost-effective mass production method for patterning large-area structures up to wafer-level (300 mm) in the micrometer and nanometer scale, fabricating complex 3-D micro/nano structures, especially making large-area patterns on the non-planar surfaces ...1.. IntroductionPatterning of surfaces in the nanometer range is a key issue in both nanoscience and nanotechnology. Nanoimprint lithography (NIL) has been an emerging technology for future nanofabrication since it was introduced by Chou et al. [1].NIL is considered to be an alternative to optical lithography (OL) and electron beam lithography (EBL), as it combines the advantages of high ...Canon, the Japanese firm best known for its printers and cameras, launched a critical tool on Friday it says can help manufacture the most advanced semiconductors around. The latest "nanoimprint ...Lithography plays a key role in micro and nanofabrication techniques. Since high functional miniaturized systems are required in various fields, such as the development of a semiconductor, chemical and biological analysis, and biomedical researches, lithography techniques have been developed and applied for their appropriate purpose.This study aims to produce a hydrophobic polymer film by mimicking the hierarchical micro/nanostructures found on the surface of rose petals. A simple and two-step UV-based nanoimprint lithography was used to copy rose petal structures on the surface of a polyurethane acrylate (PUA) film. In the first step, the rose petal was used as a …The nanoimprint resist used in this work is a PMMA (polymethyl methacrylate)-based polymeric material whereas the SU-8 25 photoresist is based on epoxy/phenolic resin. Region 1 in the DSC curve shown in figure 4(a) indicates a solvent loss cycle at temperatures below 250 °C. During this process, the solvents in the resists evaporate along with ...GLOBAL UV NANOIMPRINT LITHOGRAPHY MARKET INTRODUCTION Since the initial papers on Nano Imprint Lithography (NIL), interest in the technology has risen quickly, first among scientists and subsequently in industries including integrated optics, sensors, and micro fluidics.9Nano-Imprint Technology Trends for Semiconductor Applications 2019 | Sample | www.yole.fr | ©2019 NANOIMPRINT PROCESS • Nanoimprint lithography is a …Nanoimprint lithography is a method for making make nanometer scale patterns. In this method, systems press a mask into resist and thereby pattern it. Follow-on processes of curing and etch then transfer the pattern onto layers on a wafer. Depositing additional layers and repeating these steps creates a structure.Nanoimprint lithography manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action.This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O2 plasma, and ...Nanoimprint lithography is a fabrication method by applying nanomolds on resists to form inversed patterns. It can be utilized to fabricate high-resolution nanopatterns in a low cost and rapid fashion on both flat and curved surfaces. The fidelity of fabricated master nanopatterns and elastomer nanomolds are essential to the quality of the ...... nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve ...The advances in nanoimprint lithography, its application in nanogap metal contacts and related fabrication yield were discussed. The 5 nm linewidth and 14 nm linepitch in resist using nanoimprint lithography at room temperature with a pressure less than 15 psi was demonstrated. Gold contact were fabricated with 5 nm separation by nanoimprint in ...EV Group (EVG), a provider of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and Toppan Photomask, the world's premier photomask provider, announced that they have entered into an agreement to jointly market nanoimprint lithography (NIL) as an enabling high-volume manufacturing (HVM) process for the photonics industry. The collaboration, which ...Imitating nature and comprehending its workings is a means for human beings to advance the development of functional materials. In this study, UV nanoimprint lithography technology was utilized to successfully replicate the micro-nano hierarchical structure (micro-papillae and nano-wax tube crystals) present on the surface of the natural fresh lotus leaf.Roll-to-roll nanoimprint lithography (RTR-NIL) is a low-cost and continuous fabrication process for large-area functional films. However, the partial ultraviolet (UV) resin filling obstructs the ongoing production process. This study incorporates UV resin filling process into the nanopillars and nanopores by using RTR-NIL. A multiphase numerical …Nanoimprint lithography is a technique that has been in existence for over 20 years, as noted by Pranay Kotasthane, the chairperson of the Takshashila Institution, …We explore the limits of a simple and facile process for transferring low aspect ratio, high-resolution features defined by nanoimprint lithography. The process involves postimprint deposition of an angle-evaporated hard mask. This widens the process window for residual resist removal and facilitates easy liftoff. An added benefit is a concomitant reduction of …The Global Nanoimprint Lithography System Consumption Market is growing at a faster pace with substantial growth rates over the last few years and is estimated that the market will grow significantly in the forecasted period i.e. 2023 to 2031. The Global Nanoimprint Lithography System Consumption Market report provides a holistic evaluation of ...Radek Zielinski / Oct 13, 2023 / Work. Today, Canon made waves in the semiconductor world by announcing its new nanoimprint lithography systems for chip production. The company is positioning the ...Nanoimprint lithography (NIL) has gained increasing popularity as a cost efficient technology to replicate nanostructures in the sub-25-nm regime 1,2 with high throughput.With all dominant NIL concepts—UV-nanoimprint lithography, hot embossing, and microcontact printing-the NIL template is the most critical component as it defines the minimum feature size.Advances in Nanoimprint Lithography. Annual Review of Chemical and Biomolecular Engineering. Vol. 7:583-604 (Volume publication date June 2016) First published ...Thermal nanoimprint lithography is playing a vital role in fabricating micro/nanostructures on polymer materials by the advantages of low cost, high throughput, and high resolution. However, a typical thermal nanoimprint process usually takes tens of minutes due to the relatively low heating and cooling rate in the thermal imprint cycle. In this study, we developed an induction heating ...Nanoimprint lithography (NIL) has the potential capability of high resolution with critical dimension uniformity that is suited for patterning shrinkage, as well as providing a low cost advantage. However, the defectivity of NIL is an impediment to the practical use of the technology in semiconductor manufacturing. We have evaluated defect levels of NIL and have classified defectivity into ...nanoimprint molding, nanoimprint lithogra-phy, roll-to-roll nanoimprint lithography, and nanotechnology applications such as optical devices and moth-eye structures …Feb 25, 2021 · The nanoimprint replication of biomimetic nanostructures can be interesting for a wide range of applications. We demonstrate the process chain for Morpho-blue-inspired nanostructures, which are especially challenging for the nanoimprint process, since they consist of multilayer undercut structures, which typically cannot be replicated using nanoimprint lithography. Introduction. Nanoimprint lithography (NIL) is an embossing technique that enables the replication of micro and nanostructures [1], [2]. The high resolution on a large substrate area with low processing time makes NIL attractive for applications such as light emitting diodes, hard disk drives, display technology and solar cells [3].Nanoimprint lithography (NIL) has gained increasing popularity as a cost efficient technology to replicate nanostructures in the sub-25-nm regime 1,2 with high throughput.With all dominant NIL concepts—UV-nanoimprint lithography, hot embossing, and microcontact printing-the NIL template is the most critical component as it defines the minimum feature size.driving flash memory producers to explore nanoimprint lithography. 1.2. DEVELOPMENT OF ROADMAP This roadmap was developed through consultation with an international team of patterning experts and review of publicly available literature and other available documents. The current contributing membership is shown in the Acknowledgments.Due to the COVID-19 pandemic, the global Nanoimprint Lithography System market size is estimated to be worth USD 94 million in 2021 and is forecast to a readjusted size of USD 164.2 million by ...Imprint lithography is an effective and well known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate.Abstract. A high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated. The technique uses compression molding to create a thickness contrast pattern in a thin resist film carried on a substrate, followed by anisotropic etching to transfer the pattern through the entire resist ...Nanoimprint lithography semiconductor manufacturing system that covers diverse applications with simple patterning mechanism On October 13, 2023, Canon announced today the launch of the FPA-1200NZ2C nanoimprint semiconductor manufacturing equipment, which executes circuit pattern transfer, the most important semiconductor manufacturing process.Nanoimprint Lithography...Nanoimprint Lithography 497 precursor of a soft stamp material onto a silicon master. One of the most widely used materials is polydimethylsiloxane (PDMS) Imprint Lithography - SUSS MicroTec€¦ · SCIL Substrate Conformal Imprint Lithography UV-NIL UV Nanoimprint Lithography SMILE SUSS MicroTec Imprint Lithography ...5 Jan 2017 ... Due to its high resolution, high throughput, and low cost, nanoimprint lithography (NIL) and its variations are considered the most ...Thermal nanoimprint lithography is playing a vital role in fabricating micro/nanostructures on polymer materials by the advantages of low cost, high throughput, and high resolution. However, a typical thermal nanoimprint process usually takes tens of minutes due to the relatively low heating and cooling rate in the thermal imprint cycle. In this study, we developed an induction heating ...For UV nanoimprint lithography (UV-NIL) using polymer soft stamps, imprinting at ambient atmosphere brings additional challenges due to evaporated solvents and possible byproducts resulting from the interaction between the UV light, oxygen and the polymer-based material.Moreover, the Laplace pressure may impact differently on the capillary filling for both positive and negative patterns at ...EVG is the market-leading supplier of nanoimprint lithography (NIL) equipment and integration processes. EVG pioneered and mastered NIL from a research approach more than 15 years ago, to implementation in volume production on various substrate sizes from 2 inch compound semiconductor wafers to 300 mm wafers and even on large-area panels. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3-4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat ...Nanoimprint lithography (NIL) is a major breakthrough for next-generation lithography (NGL) due to its high resolution and simpler process compared to conventional nanoscale patterning techniques ...Nanoimprint lithography (NIL) is a promising technique for high-throughput nanopattern fabrication. In particular, thermal nanoimprint lithography (T-NIL) has the advantage of employing flexible materials and eliminating chemicals and solvents. Moreover, T-NIL is particularly suitable for compostable and recyclable materials, especially when ...This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In ...Large Area Nanoimprint Technology . SCIVAX technology has been used in concert with other technologies to allow the first ever large area substrate single-shot nanoimprint pattern transfer. ① Uniform molding technology. ② Compliant molding technology for substrates with some warpage or non-flatness. ③ Residual Layer Control Technology.Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad ...The microfabrication system is specially designed for rapid prototyping, small series production and the efficient fabrication of master templates in replication processes. For high-volume production of 2.5D microstructures the well-established replication technique nanoimprint lithography (NIL) is a highly productive solution.Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of ...This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In ...Nanoimprint Nanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was...Roll-to-roll (R2R) nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale application. In the present work, a general literature review on the various types of nanoimprint lithography processes especially R2R NIL and the methods commonly adapted to fabricate imprint molds are ...The nanoimprint method is a high-throughput, high-resolution processing technique, which can quickly fabricate nano-patterned structures on the surface of materials. [49] , [50] , [51] Till now, nanoimprint method (mainly thermal imprint method) has been tried to prepare ordered proton conductor nano-patterned structures on the surface of ...Nanoimprint lithography (NIL) is a cost-effective and high-throughput technique for replicating nanoscale structures that does not require expensive light …The EV Group has teamed up with Notion Systems to develop a high speed, fully automated process for nanolithography using an inkjet printing process rather than spin coating. The deal will create the first fully integrated and automated nanoimprint lithography (NIL) system with inkjet coating capabilities. This will enable high volume displays ...The Advantages of Nanoimprint Lithography for Semiconductor Device Manufacturing Toshiya Asano 1, Keita Sakai 1, Kiyohito Yamamoto 1, Hiromi Hiura 1, Takahiro Nakayama 1, Tomohiko Hayashi 1, Yukio Takabayashi 1, Takehiko Iwanaga 1, Douglas J. Resnick 2 1Canon Inc., 20-2, Kiyohara-Kogyodanchi, Utsunomiya-shi, Tochigi 321-3292 Japan …Apr 20, 2023 · Nanoimprint lithography, which for decades has trailed behind traditional optical lithography, is emerging as the technology of choice for the rapidly growing photonics and biotech chips markets. First introduced in the mid-1990s, nanoimprint lithography (NIL) has consistently been touted as a lower-cost alternative to traditional optical ... . 19 Feb 2020 ... Nanoimprint lithography (NIHere, nanoimprint lithography (NIL) combined with SD UV-nanoimprint lithograph y (UV-NIL) by using a flexible mold has been proven to be a cost-effective. mass production method f or patter ning large-area str uctures up to wafer-le v el (300 mm ...Nanoimprinting can promise state-of-the-art smaller electronics. Although nanoimprint lithography (NIL) is not yet an industrial process with well-established standard, extensive interests in NIL processes come from a large community of sensor, biochip, and nano-optics manufactures and institutes [].Nanoimprinting has received … ... nanoimprint lithography (NIL) coming to the forefro Thus, the nanoimprint lithography is an interesting process for fabricating large-area nanostructures on wafer level for microsystem and microelectronic technologies to drastically reduce the costs per nanostructured wafer. At the Fraunhofer Institute for Electronic Nano Systems ENAS exists a process flow for the adjusted UV nanoimprint ...Robust, buoyant, superhydrophobic PVB/SiO2 coatings were successfully formed on wood surface through a one-step solvothermal method and a nanoimprint lithography method. The as-prepared PVB/SiO2 ... The startup closed Series B funding last October with ...

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